The Unseen Engine of Modern Electronics
Discover the Dutch machine that’s indispensable for creating the world’s most advanced microchips.
A Core of Extreme Heat
40x
Hotter than the surface of the sun. Inside each machine, a plasma of over 200,000°C is created 50,000 times a second to generate the light needed for chipmaking.
What is This Machine?
It’s an Extreme Ultraviolet (EUV) lithography system from ASML, a Dutch company with a global monopoly. These machines are the only tools capable of manufacturing the most advanced semiconductors that power our digital world.
Market Share
ASML is the world’s sole supplier of EUV lithography machines.
Unit Cost
For a standard NXE system. Next-gen systems cost even more.
Boeing 747s
Required to transport the components of a single EUV machine.
Precision
The wafer stage positions itself with sub-nanometer accuracy.
An Atomic-Scale Production Line
EUV lithography is a marvel of engineering, combining extreme conditions with microscopic precision. Click through the steps below to see how it works, from generating light to printing circuits.
EUV vs. DUV: A Generational Leap
The key difference between new EUV technology and older Deep Ultraviolet (DUV) systems is the wavelength of light used. EUV’s extremely short wavelength allows for printing much smaller and more complex chip designs, a feat impossible with DUV.
The Geopolitical Choke Point
ASML’s monopoly has turned its machines into strategic assets in the global “chip war.” Controlling access to EUV technology means controlling the future of advanced computing, AI, and national security.
ASML’s Soaring Revenue
The surging global demand for advanced chips has fueled exponential growth for ASML, solidifying its critical role in the tech ecosystem.
The Impact of Export Controls
Geopolitical tensions have led to restrictions on selling EUV and DUV machines to China, aiming to slow its technological progress. This directly impacts ASML’s sales distribution.
Pushing the Boundaries of Physics
ASML isn’t stopping. The next generation of “High-NA” EUV systems is already being deployed, promising to print even smaller, more powerful chips and continue Moore’s Law for the next decade.
Current EUV (NXE)
- Resolution: 13 nm
- Numerical Aperture (NA): 0.33
- Chip Nodes: 7nm, 5nm, 3nm
- Cost: ~$200 Million
Next-Gen High-NA (EXE)
- Resolution: 8 nm
- Numerical Aperture (NA): 0.55
- Chip Nodes: 2nm and beyond
- Cost: ~$370 Million