ASML EUV Lithography: Interactive Explainer

ASML EUV Lithography: The Machine That Powers the Future

The Unseen Engine of Modern Electronics

Discover the Dutch machine that’s indispensable for creating the world’s most advanced microchips.

A Core of Extreme Heat

40x

Hotter than the surface of the sun. Inside each machine, a plasma of over 200,000°C is created 50,000 times a second to generate the light needed for chipmaking.

What is This Machine?

It’s an Extreme Ultraviolet (EUV) lithography system from ASML, a Dutch company with a global monopoly. These machines are the only tools capable of manufacturing the most advanced semiconductors that power our digital world.

100%

Market Share

ASML is the world’s sole supplier of EUV lithography machines.

~$200M

Unit Cost

For a standard NXE system. Next-gen systems cost even more.

3

Boeing 747s

Required to transport the components of a single EUV machine.

0.25nm

Precision

The wafer stage positions itself with sub-nanometer accuracy.

An Atomic-Scale Production Line

EUV lithography is a marvel of engineering, combining extreme conditions with microscopic precision. Click through the steps below to see how it works, from generating light to printing circuits.

EUV vs. DUV: A Generational Leap

The key difference between new EUV technology and older Deep Ultraviolet (DUV) systems is the wavelength of light used. EUV’s extremely short wavelength allows for printing much smaller and more complex chip designs, a feat impossible with DUV.

The Geopolitical Choke Point

ASML’s monopoly has turned its machines into strategic assets in the global “chip war.” Controlling access to EUV technology means controlling the future of advanced computing, AI, and national security.

ASML’s Soaring Revenue

The surging global demand for advanced chips has fueled exponential growth for ASML, solidifying its critical role in the tech ecosystem.

The Impact of Export Controls

Geopolitical tensions have led to restrictions on selling EUV and DUV machines to China, aiming to slow its technological progress. This directly impacts ASML’s sales distribution.

Pushing the Boundaries of Physics

ASML isn’t stopping. The next generation of “High-NA” EUV systems is already being deployed, promising to print even smaller, more powerful chips and continue Moore’s Law for the next decade.

Current EUV (NXE)

  • Resolution: 13 nm
  • Numerical Aperture (NA): 0.33
  • Chip Nodes: 7nm, 5nm, 3nm
  • Cost: ~$200 Million

Next-Gen High-NA (EXE)

  • Resolution: 8 nm
  • Numerical Aperture (NA): 0.55
  • Chip Nodes: 2nm and beyond
  • Cost: ~$370 Million

Interactive report generated from source material on ASML’s EUV lithography systems.

This is a conceptual visualization and not affiliated with ASML Holding N.V.